Intern - Photolithography Process Development

Micron Technology • singapore, Singapore

📍 Location

singapore

⏰ Job Type

Full-time

📅 Posted

June 05, 2026

About the Role

Overview Location: Fab10N Singapore 
Department: Process Development – Singapore (Photolithography) 
Project title: Edge Placement Error Modeling and Optimization 
Project Description: Develop and optimize models for overlay and critical dimension uniformity improvement. Project scope: Introduction to photolithography for semiconductor patterning and control. 
Deliverables Develop and deploy edge placement error model for photolithography 
Skillset Required Mathematical modeling and numerical analysis with programming knowledge (preferred) 
Characterization techniques: SEM, optical imaging 
Course Of Interest Semiconductor Manufacturing 
Nanomaterials 
Physics 
Mathematical modeling 
Programming 
Duration 4-6 months (minimum 4 months) 
About the Company We are an industry leader in innovative me...
            

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